Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.

As shared in the previous newsletter, a new Electron Beam Lithography (EBL) system—EBPG 5150plus—was acquired through an NSF Major Research Instrumentation (MRI) award, thanks to the efforts of ...

The groundbreaking discovery could open new doors for other researchers working with delicate materials such as cell membranes. (Nanowerk News) Imagine drawing on something as delicate as a living ...

EurekAlert! - Metasurfaces, ultra-compact optical devices capable of "precisely manipulating light," have shown great potential in augmented reality (AR) glasses, holographic projection, biosensing, ...

Researchers have developed a flexible material that can quickly change its surface texture and colors, offering potential ...